Concepedia

Concept

vacuum plasma technology

Parents

810

Publications

32.1K

Citations

1.8K

Authors

445

Institutions

About

Vacuum plasma technology is a scientific and technological domain focused on the generation, characterization, control, and application of partially or fully ionized gases (plasma) operating under sub-atmospheric pressure conditions. This field investigates the fundamental physics and chemistry governing plasma behavior in vacuum environments and is significant for enabling precise material processing, surface engineering, thin-film deposition, and serving as a critical technology in diverse areas such as microelectronics fabrication and controlled nuclear fusion research.

Top Authors

Rankings shown are based on concept H-Index.

EK

Toshiba (Japan)

LW

Xi'an Jiaotong University

SJ

Xi'an Jiaotong University

GA

General Electric (United States)

II

Tel Aviv University

Top Institutions

Rankings shown are based on concept H-Index.

Tel Aviv University

Tel Aviv, Israel

Toshiba (Japan)

Tokyo, Japan

University of California, Berkeley

Berkeley, United States